Literature DB >> 20376818

Directed self-assembly of block copolymers on two-dimensional chemical patterns fabricated by electro-oxidation nanolithography.

Ji Xu1, Soojin Park, Shiliu Wang, Thomas P Russell, Benjamin M Ocko, Antonio Checco.   

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Year:  2010        PMID: 20376818     DOI: 10.1002/adma.200903640

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


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  3 in total

1.  Directed Self-Assembly: Expectations and Achievements.

Authors:  Prashant Kumar
Journal:  Nanoscale Res Lett       Date:  2010-07-21       Impact factor: 4.703

2.  Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits.

Authors:  Jonathan Berson; Assaf Zeira; Rivka Maoz; Jacob Sagiv
Journal:  Beilstein J Nanotechnol       Date:  2012-02-16       Impact factor: 3.649

3.  Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation.

Authors:  Haeng-Deog Koh; Mi-Jeong Kim
Journal:  Materials (Basel)       Date:  2016-08-01       Impact factor: 3.623

  3 in total

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