| Literature DB >> 20356283 |
Myoung-Hwan Park1, Xuexin Duan, Yuval Ofir, Brian Creran, Debabrata Patra, Xing Yi Ling, Jurriaan Huskens, Vincent M Rotello.
Abstract
Dithiocarbamate-mediated bond formation combined with soft lithography was used for the selective immobilization of amine-functionalized silica nanoparticles on gold substrates. The available amine groups on the upper surface of the immobilized silica nanoparticles were further utilized for postdeposition of additional materials including particles, dyes, and biomolecules. The robustness of dithiocarbamate-mediated immobilization enables orthogonal assembly on surfaces via selective removal of the masking thiol ligands using iodine vapor etching followed by further functionalization.Entities:
Year: 2010 PMID: 20356283 DOI: 10.1021/am9009007
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229