Literature DB >> 20203606

Reinventing germanium avalanche photodetector for nanophotonic on-chip optical interconnects.

Solomon Assefa1, Fengnian Xia, Yurii A Vlasov.   

Abstract

Integration of optical communication circuits directly into high-performance microprocessor chips can enable extremely powerful computer systems. A germanium photodetector that can be monolithically integrated with silicon transistor technology is viewed as a key element in connecting chip components with infrared optical signals. Such a device should have the capability to detect very-low-power optical signals at very high speed. Although germanium avalanche photodetectors (APD) using charge amplification close to avalanche breakdown can achieve high gain and thus detect low-power optical signals, they are universally considered to suffer from an intolerably high amplification noise characteristic of germanium. High gain with low excess noise has been demonstrated using a germanium layer only for detection of light signals, with amplification taking place in a separate silicon layer. However, the relatively thick semiconductor layers that are required in such structures limit APD speeds to about 10 GHz, and require excessively high bias voltages of around 25 V (ref. 12). Here we show how nanophotonic and nanoelectronic engineering aimed at shaping optical and electrical fields on the nanometre scale within a germanium amplification layer can overcome the otherwise intrinsically poor noise characteristics, achieving a dramatic reduction of amplification noise by over 70 per cent. By generating strongly non-uniform electric fields, the region of impact ionization in germanium is reduced to just 30 nm, allowing the device to benefit from the noise reduction effects that arise at these small distances. Furthermore, the smallness of the APDs means that a bias voltage of only 1.5 V is required to achieve an avalanche gain of over 10 dB with operational speeds exceeding 30 GHz. Monolithic integration of such a device into computer chips might enable applications beyond computer optical interconnects-in telecommunications, secure quantum key distribution, and subthreshold ultralow-power transistors.

Entities:  

Year:  2010        PMID: 20203606     DOI: 10.1038/nature08813

Source DB:  PubMed          Journal:  Nature        ISSN: 0028-0836            Impact factor:   49.962


  4 in total

1.  Ultra-low capacitance and high speed germanium photodetectors on silicon.

Authors:  Long Chen; Michal Lipson
Journal:  Opt Express       Date:  2009-05-11       Impact factor: 3.894

2.  42 GHz p.i.n Germanium photodetector integrated in a silicon-on-insulator waveguide.

Authors:  Laurent Vivien; Johann Osmond; Jean-Marc Fédéli; Delphine Marris-Morini; Paul Crozat; Jean-François Damlencourt; Eric Cassan; Y Lecunff; Suzanne Laval
Journal:  Opt Express       Date:  2009-04-13       Impact factor: 3.894

3.  31 GHz Ge n-i-p waveguide photodetectors on Silicon-on-Insulator substrate.

Authors:  Tao Yin; Rami Cohen; Mike M Morse; Gadi Sarid; Yoel Chetrit; Doron Rubin; Mario J Paniccia
Journal:  Opt Express       Date:  2007-10-17       Impact factor: 3.894

4.  High performance, waveguide integrated Ge photodetectors.

Authors:  Donghwan Ahn; Ching-Yin Hong; Jifeng Liu; Wojciech Giziewicz; Mark Beals; Lionel C Kimerling; Jurgen Michel; Jian Chen; Franz X Kärtner
Journal:  Opt Express       Date:  2007-04-02       Impact factor: 3.894

  4 in total
  21 in total

1.  Ultrafast direct modulation of a single-mode photonic crystal nanocavity light-emitting diode.

Authors:  Gary Shambat; Bryan Ellis; Arka Majumdar; Jan Petykiewicz; Marie A Mayer; Tomas Sarmiento; James Harris; Eugene E Haller; Jelena Vučković
Journal:  Nat Commun       Date:  2011-11-15       Impact factor: 14.919

2.  High-density waveguide superlattices with low crosstalk.

Authors:  Weiwei Song; Robert Gatdula; Siamak Abbaslou; Ming Lu; Aaron Stein; Warren Y-C Lai; J Provine; R Fabian W Pease; Demetrios N Christodoulides; Wei Jiang
Journal:  Nat Commun       Date:  2015-05-11       Impact factor: 14.919

3.  Recent advances in infrared imagers: toward thermodynamic and quantum limits of photon sensitivity.

Authors:  Simone Bianconi; Hooman Mohseni
Journal:  Rep Prog Phys       Date:  2020-02-04

4.  Ge-photodetectors for Si-based optoelectronic integration.

Authors:  Jian Wang; Sungjoo Lee
Journal:  Sensors (Basel)       Date:  2011-01-12       Impact factor: 3.576

5.  Single-chip photonic transceiver based on bulk-silicon, as a chip-level photonic I/O platform for optical interconnects.

Authors:  Gyungock Kim; Hyundai Park; Jiho Joo; Ki-Seok Jang; Myung-Joon Kwack; Sanghoon Kim; In Gyoo Kim; Jin Hyuk Oh; Sun Ae Kim; Jaegyu Park; Sanggi Kim
Journal:  Sci Rep       Date:  2015-06-10       Impact factor: 4.379

6.  Plasmonic field confinement for separate absorption-multiplication in InGaAs nanopillar avalanche photodiodes.

Authors:  Alan C Farrell; Pradeep Senanayake; Chung-Hong Hung; Georges El-Howayek; Abhejit Rajagopal; Marc Currie; Majeed M Hayat; Diana L Huffaker
Journal:  Sci Rep       Date:  2015-12-02       Impact factor: 4.379

7.  On-Chip Integrated, Silicon-Graphene Plasmonic Schottky Photodetector with High Responsivity and Avalanche Photogain.

Authors:  Ilya Goykhman; Ugo Sassi; Boris Desiatov; Noa Mazurski; Silvia Milana; Domenico de Fazio; Anna Eiden; Jacob Khurgin; Joseph Shappir; Uriel Levy; Andrea C Ferrari
Journal:  Nano Lett       Date:  2016-04-22       Impact factor: 11.189

8.  A self-assembled microbonded germanium/silicon heterojunction photodiode for 25 Gb/s high-speed optical interconnects.

Authors:  Chih-Kuo Tseng; Wei-Ting Chen; Ku-Hung Chen; Han-Din Liu; Yimin Kang; Neil Na; Ming-Chang M Lee
Journal:  Sci Rep       Date:  2013-11-15       Impact factor: 4.379

9.  Ultrahigh Responsivity-Bandwidth Product in a Compact InP Nanopillar Phototransistor Directly Grown on Silicon.

Authors:  Wai Son Ko; Indrasen Bhattacharya; Thai-Truong D Tran; Kar Wei Ng; Stephen Adair Gerke; Connie Chang-Hasnain
Journal:  Sci Rep       Date:  2016-09-23       Impact factor: 4.379

10.  Defect-free high Sn-content GeSn on insulator grown by rapid melting growth.

Authors:  Zhi Liu; Hui Cong; Fan Yang; Chuanbo Li; Jun Zheng; Chunlai Xue; Yuhua Zuo; Buwen Cheng; Qiming Wang
Journal:  Sci Rep       Date:  2016-12-12       Impact factor: 4.379

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