| Literature DB >> 20087458 |
Bing-Yang Cao1, Jun Sun1,2, Min Chen1, Zeng-Yuan Guo1.
Abstract
This review is focused on molecular momentum transport at fluid-solid interfaces mainly related to microfluidics and nanofluidics in micro-/nano-electro-mechanical systems (MEMS/NEMS). This broad subject covers molecular dynamics behaviors, boundary conditions, molecular momentum accommodations, theoretical and phenomenological models in terms of gas-solid and liquid-solid interfaces affected by various physical factors, such as fluid and solid species, surface roughness, surface patterns, wettability, temperature, pressure, fluid viscosity and polarity. This review offers an overview of the major achievements, including experiments, theories and molecular dynamics simulations, in the field with particular emphasis on the effects on microfluidics and nanofluidics in nanoscience and nanotechnology. In Section 1 we present a brief introduction on the backgrounds, history and concepts. Sections 2 and 3 are focused on molecular momentum transport at gas-solid and liquid-solid interfaces, respectively. Summary and conclusions are finally presented in Section 4.Entities:
Keywords: boundary conditions; fluid-solid interfaces; micro/nanofluidics; molecular dynamics; molecular momentum transport; momentum accommodation coefficient; velocity slip
Mesh:
Substances:
Year: 2009 PMID: 20087458 PMCID: PMC2808004 DOI: 10.3390/ijms10114638
Source DB: PubMed Journal: Int J Mol Sci ISSN: 1422-0067 Impact factor: 6.208
Figure 1.Schematic of plate Poiseuille flow considering no-slip and slip boundary conditions.
Figure 2.Schematic of velocity slip and nonequilibrium of molecules near a solid surface.
Figure 3.Schematic of (a) no-slip, (b) slip, and (c) effective (apparent) slip.
Magnitudes of first- and second-order slip coefficients in linear slip models.
| 1 | 0 | Maxwell [ |
| 1 | 5π/12 | Schamberg (from [ |
| 1 | −0.5 | Karniadakis and Beskok [ |
| 1.1466 | 0.9756 or 0.647 | Cercignani [ |
| 1.1466 | 0 | Albertoni |
| ≈1 | ≈0.5 | Chapman and Cowling [ |
| 0.7252 | 0 | Loyalka [ |
| 1.0299 | 0 | Loyalka |
| 1.11 | 0.61 | Hadjiconstantinou [ |
| 1.1466 | 0.14 | Sreekanth (from [ |
| 1 | 9/8 | Deissler (from [ |
| 1 | 0.5 | Hsia and Domoto (from [ |
| 1 | 2/9 | Mitsuya [ |
| 1.125 | 0 | Pan |
| 1 | 0.145–0.19 | Lockerby [ |
| 4/3 | 0.25 | Wu (Kn < 1) [ |
Expressions of first- and second-order slip coefficients in linear slip models.
| 0 | Maxwell [ | |
| Karniadakis and Beskok [ | ||
| Cercignani [ | ||
| 0 | Loyalka [ | |
| 0 | Loyalka | |
| Lockerby [ | ||
| Wu [ |
Figure 4.Comparison of velocity profiles by kinetic theory and linear slip theory.
Figure 5.Effective mean free path distributions for different Knudsen numbers.
TMAC measured by molecular beam experiments.
| 1969 [ | Ar+ | Au | — | 0.5–0.95 |
| Al | 0.42–0.95 | |||
| 1969 [ | Ar | Al with varnish | — | 0.7–1.4 |
| N2 | 0.4–1.3 | |||
| 1974 [ | He | Polished Cu | 300 | 0.67–0.96 |
| Cu with 5μm grooves | 0.96–1.16 | |||
| Cu with adsorbents | 0.49–1.2 | |||
| W (100) | 0.77–0.93 | |||
| Au (111) | 0.68–0.87 | |||
| Glass | 0.71–0.79 | |||
| 1979 [ | He | Al | Room temperature | ~1 |
| Al2O3 | ||||
| 1998 [ | N2 | C | 273 | > 1 |
| Pt | 273 | 0.82–0.96 | ||
| Glass | 293 | 0.80–0.98 | ||
| Disk | 293 | 0.84–0.96 | ||
TMAC measured by spinning rotor gauge experiments.
| 1974 [ | He | polished steel | 298 | — | 0.824, 1.040 |
| 1977 [ | He | Mo | — | — | 0.2 (He, Mo) |
| 1980 [ | He, Ne, Ar, Kr, Xe, CH4, N2, H2, O2, CO, CO2 | steel | — | > 1 | 0.994–1.027 |
| 1996 [ | Ne, Ar, Kr, CH4, N2, C2H6 | steel | 293 | 0.01-1 | 0.83–1.01 |
| 1996 [ | He | steel | 297 | 0.00464–0.583 | 0.8836–0.9714 |
| 1997 [ | N2 | steel | 294 | 0.00163–0.0258 | 0.83–0.89 |
| 2001 [ | He | steel | 293 | Slip regime | 0.8134–0.8412 |
| 2003 [ | N2 | stainless steel etched or with H2O covered | 290–313 | — | 1.158–1.166 |
TMAC measured by other experimental techniques.
| 1949 [ | air | Forged | alloy299 | 0.04–0.1 | 0.72–1.07 |
| Duralumin | |||||
| 0.1–8.3 | 0.71–0.77 [ | ||||
| ST-14 | |||||
| 1973 [ | He | glass | room temperature | slip flow regime | 0.895 ± 0.004 |
| free molecular regime | 0.935 ± 0.004 | ||||
| Ne | slip flow regime | 0.865 ± 0.004 | |||
| free molecular regime | 0.929 ± 0.003 | ||||
| Ar | |||||
| slip flow regime | 0.927 ± 0.028 | ||||
| free molecular regime | 0.975 ± 0.006 | ||||
| 1974 [ | Kr | 0.00049–0.0096 | 0.995 ± 0.026 | ||
| Xe | 0.00036–0.007 | 1.010 ± 0.040 | |||
| H2 | glass | 77.2 | 0.0011–0.022 | 0.957 ± 0.015 | |
| D2 | (0.05–1.5 μm) | 293 | 0.0011–0.022 | 0.934 ± 0.006 | |
| N2 | 0.0006–0.012 | 0.925 ± 0.014 | |||
| CO2 | 0.0004–0.0078 | 0.993 ± 0.009 | |||
| 1975 [ | He | 298 | — | ||
| Ne | Pt, Ag, W | 0.375–0.96 | |||
| O2 | rough(254 nm) | 0.06–0.84 | |||
| CO2 | adsorbents | ||||
| N2 | |||||
| 2004 [ | Xe | Bronze | 300.3 | free molecular regime | 0.90 |
| Ar | |||||
| 0.95 | |||||
| H2 | 0.94 | ||||
| He | 1.0 | ||||
| 2008 [ | Air | Glass | Room temperature | 0.01–10 | 0.72 |
TMAC calculated by MD simulations.
| 1997 [ | Ar | Ni(001) | 150 | — | −0.3~0.5 |
| 300 | −0.6~0.15 | ||||
| 2001 [ | Ar | Pt(111) | 300–450 | 0.2 | 0.19 |
| Xe | 0.81 | ||||
| 2003 [ | LJ potential | FCC(110) | 200–400 | — | 0–1 |
| 2005 [ | Ar | Pt(111) | 100–300 | 0.02-0.16 | 0.2–0.4 |
| 2005 [ | N2 | Pt(111) | 300 | 0.2 | |
| smooth | 0.29–0.33 | ||||
| Xe adsorbed | |||||
| 0.84–0.88 | |||||
| 2005 [ | Ar | Pt(111) | 300, 600 | 0.2 | 0.89, 0.41 |
| Xe | 0.95, 0.80 | ||||
| 2007 [ | He | Cu with adsorbent layer | ––– | — | 0.25–1.2 |
| 2008 [ | Ar | Pt | 100–500 | 0.031–0.061 | 0.04–0.8 |
| 2008 [ | LJ potential | LJ potential | — | — | ~inversed collision number |
| 2008 [ | LJ potential | LJ potential | — | 0.028 | 0.51–0.83 |
| 2009 [ | Ar | Pt | 100–300 | 0.12 | 0.348–0.87 |
Figure 6.Regimes depending on both Kn and surface roughness.
Summary of experimental measurements of the slip length using the FR technique.
| 1956 [ | Glass + DDS | Water | -- | -- | 1–10 μm | SRI |
| 1984 [ | Quartz + TMS | Water | 70–90° | -- | 30 nm | SRD/TD |
| Mercury | 115–130° | -- | 70 nm | SRD/TD | ||
| CCL4 | 0° | -- | No-slip | -- | ||
| Benzene | 0° | -- | No-slip | -- | ||
| 1999 [ | Acrylic Resin + FAMAR | Tap water | 150° | -- | ~240 nm | -- |
| 1999 [ | Quartz + CTA(+) | CTAB solutions | 70° | -- | 10 nm | SRI |
| 2002 [ | Glass + photoresist | Water | -- | 0.5 nm (pp) | No-slip | -- |
| Hexane | -- | 10 nm | SRI | |||
| Hexadecane | -- | 25 nm | SRI | |||
| Decane | -- | 15 nm | SRI | |||
| Silicon oil | -- | 20 nm | SRI | |||
| 2003 [ | Silicon | Water | ≈0° | 1.1 nm (rms) | 0–10 nm | SRD |
| Silicon + OTS | Water | ≧90° | 0.3 nm (rms) | 5–35 nm | SRD | |
| 2003 [ | Poly(carbonate) + PVP | SDS solutions | <90° | -- | 20 nm | SRI |
| 2004 [ | Silicon (SM) | Water | >90° | -- | No-slip | SRI |
| Silicon (SP) | Water | 130–174° | -- | >20 μm | SRI/PD | |
| 2006 [ | Silicon + SiO2 (SP) | Water | <90° | -- | 30 nm (t) | SRI/PD |
| 0 (t) | SRI/PD | |||||
| Silicon + SiO2 + Teflon (SP) | ~130° | -- | 143 nm (p) | SRI/PD | ||
| 61 nm (p) | SRI/PD | |||||
| 2008 [ | Silicon | Isopropanol | -- | 8.5 nm | <5nm | -- |
| -- | <5 nm | -- | ||||
| Isopropanol | -- | 0.5 nm | 5–30 nm | SRD | ||
| -- | 40–120 nm | SRD | ||||
Symbols: --: unknown parameter; DDS: dimetheldichlorosilane; TMS: trimethylchlorosilane; FAMAR: fluorine-alkane-modified acrylic resin; CTAB/CTA(+): cetyltrimethyl ammonium bromide; OTS: octadecyltrichlorosilane; PVP: polyvinylpyridine; SDS: sodium dodecyl sulfate; SM: smooth; SP: surface patterned; pp: peak to peak; rms: root mean square; SRD: shear rate dependence; SRI: shear rate independence; TD: temperature dependence; PD: pattern dependence.
Summary of experimental measurements of the slip length using the DF technique.
| 1985 [ | Mica | OMCTS | -- | -- | No-slip | -- |
| Tetradecane | -- | -- | No-slip | -- | ||
| Hexadecane | -- | -- | No-slip | -- | ||
| 1986 [ | Mica | Water | -- | -- | No-slip | -- |
| Tetradecane | -- | -- | No-slip | -- | ||
| 1989 [ | Silica | NaCl solutions | 45° | 0.5 nm (av) | No-slip | -- |
| 1993 [ | 6 surfaces | 9 liquids | -- | 0.2-50 nm (pp) | No-slip | -- |
| 2001 [ | Mica + HDA | Tetradecane | 12° | ≈0.1 nm | 0–1 μm | SRD |
| Mica + OTE | Tetradecane | 44° | 0–1.5 μm | SRD | ||
| Water | 110° | 0–2.5 μm | SRD | |||
| 2001 [ | Cobalt | Glycerol | 20–60° | 1 nm (pp) | No-slip | -- |
| Gold + thiol | 90° | 40 nm | SRI | |||
| 2002 [ | Mica + OTS | Water | 75–105° | 6 nm (rms) | No-slip | -- |
| Tetradecane | 12–35° | 6 nm (rms) | No-slip | -- | ||
| Mica + .8 PPO | Water | 85–110° | 3.5 nm (rms) | 0–5 nm | SRD | |
| Tetradecane | 21–38° | 3.5 nm (rms) | 0–5 nm | SRD | ||
| Mica + .2 PPO | Water | 90–110° | 2 nm (rms) | 0–20 nm | SRD | |
| Tetradecane | -- | 2 nm (rms) | 0–20 nm | SRD | ||
| Mica + OTE | Water | 110° | 0.2 nm (rms) | 0–40 nm | SRD | |
| Tetradecane | 38° | 0.2 nm (rms) | 0–40 nm | SRD | ||
| 2002 [ | Mica + PVP/PB | Tetradecane | -- | ≈0.1 nm (th) | No-slip | -- |
| Mica + PVA | Water | -- | 0–80 nm | SRD | ||
| 2002 [ | Mica | Complete | -- | No-slip | -- | |
| Mica + HDA | Octane | -- | -- | 0–2 nm | SRD | |
| Dodadecane | -- | -- | 0–10 nm | SRD | ||
| Tetradecane | 12° | -- | 0–15 nm | SRD | ||
| 2002 [ | Glass | Glycerol | <5° | 1 nm (pp) | No-slip | -- |
| Glass + OTS | Glycerol | 95° | 50–200 nm | SRI | ||
| Water | 100° | 50–200 nm | SRI | |||
| 2005 [ | Pyrex | Water | Hydrophilic | 1 nm (pp) | No-slip | -- |
| Dodecane | Hydrophilic | No-slip | -- | |||
| Pyrex + OTS | Water | 105° | -- | 19 nm | SRI | |
| 2001 [ | Silica + gold + thiols | Sucrose solutions | 40–70° | 0.6 nm (rms) | 0–15 nm | SRD |
| 2002 [ | Mica/glass | NaCl solutions | Complete | 1 nm (rms) | 8–9 nm | SRI |
| 2002 [ | Mica/glass | 1-propanol | <90° | 1 nm (rms) | 10–14 nm | -- |
| 2003 [ | Silicon/glass | Sucrose solutions | Complete | 0.7 nm (rms) | 0–40 nm | SRD/RD |
| Silicon/glass + KOH | 4 nm (rms) | 80 nm | SRD/RD | |||
| 12.1 nm (rms) | 100–175 nm | SRD/RD | ||||
| 2003 [ | Silica + gold + thiols | Sucrose solutions | 40–70° | 0.6 nm (rms) | 0–18 nm | SRD |
| 2003 [ | Silica/glass | NaCl solutions | Complete | 0.3 nm (rms) | No-slip | SRD |
| Polystyrene | 90° | 2.5 nm (rms) | 4–10 nm | SRD | ||
| 2004 [ | Borosilicate + HTS | Octane | 13° | 0.3 nm (rms) | No-slip | -- |
| Dodecane | 32° | No-slip | -- | |||
| Tridecane | 35° | 10 nm | -- | |||
| Tetradecane | 37° | 15 nm | -- | |||
| Pentadecane | 39° | 10 nm | -- | |||
| Hexadecane | 39° | 20 nm | -- | |||
| Cyclohexane | 25° | 10 nm | -- | |||
| Benzene | 32° | 50 nm | -- | |||
| Aniline | 64° | 50 nm | -- | |||
| Water | 97° | 30 nm | -- | |||
| Benzaldehyde | 62° | 20 nm | -- | |||
| Nitrobenzene | 63° | 10 nm | -- | |||
| 2-Nitroanisole | 70° | No-slip | -- | |||
| 2004 [ | Silica/mica | Water | Complete | -- | 80–140 nm | SRD |
| Silica/mica + CTAB | CTAB solutions | >90° | -- | 50–80 nm | SRD | |
| 2006 [ | Glass + Gold | NaCl solutions | 90° (a) | 0.5–11 nm (rms) | No-slip | SRI |
| 63° (r) | ||||||
Symbols: --: unknown parameter; HDA: 1-hexadecylamine; OTE: octadecyltriethoxysilane; OTS: octadecyltrichlorosilane; PPO: polystyrene (PS) and polyvinylpyridine (PVP) followed by coating of OTE; PVP/PB: polyvinylpyridine and polybutadiene; PVA: polyvinylalcohol; KOH: potassium hydroxide; HTS: hexadecyltrichlorosilane; CTAB: cetyltrimethyl ammonium bromide; OMCTS: octamethylcyclotetrasiloxane; a: advancing contact angle; r: receding contact angle; av: average; pp: peak to peak; rms: root mean square; th: polymer thickness; SRD: shear rate dependence; SRI: shear rate independence; RD: roughness dependence.
Summary of experimental measurements of the slip length using other indirect techniques.
| ST: 1999 [ | Silica | Proanediol | ≈0° | -- | No-slip | -- |
| Proanediol + Va | -- | 1 μm | -- | |||
| PDMS | -- | -- | No-slip | -- | ||
| Silica + DETMDS | Proanediol | 70–80° | -- | No-slip | -- | |
| Proanediol + Va | -- | 1 μm | -- | |||
| PDMS | -- | -- | No-slip | -- | ||
| SPT: 2002 [ | Quartz | KCl solutions | -- | 2 nm (pp) | No-slip | -- |
| Quartz + TMS | KCl solutions | 80–90° | 25 nm (pp) | 5–8 nm | -- | |
| DRS: 2005 [ | Acrylic polymer+TT Sandpaper+TT | water | 156° | Smooth | -- | -- |
| >90° | 8,15 μm | Slip | -- | |||
| CPT: 2006 [ | Silicon (TOP) | Water | ~10° | 0.3 nm | Slip | VD |
| Silicon (Teflon) | ~120° | 0.6 nm | Slip | |||
| Silicon (SP + TOP) | ~0° | -- | Slip | |||
| Silicon (SP+ Teflon) | 175° | -- | ~20 μm | |||
| Silicon (TOP) | ||||||
| Silicon (Teflon) | 30wt% glycerin | -- | 0.3 nm | Slip | VD | |
| Silicon (SP + TOP) | -- | 0.6 nm | Slip | |||
| Silicon (SP + Teflon) | -- | -- | Slip | |||
| --° | -- | ~50 μm | ||||
| TM: | Silica | Aqueous | Hydrophilic | <1 nm (pp) | No-slip | -- |
| 2006 [ | Silica + OTS | solutions | Hydrophobic | <1 nm (pp) | ~18 nm | -- |
| Joly | Silica + OTS | Hydrophobic | 3 nm (rms) | No-slip | RD | |
Symbols: --: unknown parameter; DETMDS: diethyltetramethyldisilazan; TMS: trimethylchlorosilane; TOP: treated by oxygen plasma; SP: surface patterned; OTS: octadecyltrichlorosilane; PDMS: polydimethylsiloxane; pp: peak to peak; rms: root mean square; VD: viscosity dependence; RD: roughness dependence.
Summary of experimental measurements of the slip length using the μPIV technique.
| 2002 [ | Glass | Water | ≈0° | -- | No-slip | -- |
| Glass + OTS | 120° | 0.2 nm | 0.9 μm | -- | ||
| 2005 [ | Glass | Water | ≈0° | 0.5 nm(rms) | 50 nm | -- |
| Glass + OTS | 95° | No-slip | -- | |||
| Glass + CDOS | 95° | 50 nm | -- | |||
| 2006 [ | PDMS | -- | 100° | -- | ~100 μm | SRI/PD |
| PDMS (SP) | 156° | -- | ~250 μm | SRI/PD | ||
| PDMS (SP+ ASC) | >150° | -- | ~1.25 mm | SRI/PD | ||
| 2006 [ | CNT forests | DI-water | >165° | 1.7 μm | ~0.47 μm | RD |
| 3.5 μm | ~0.98 μm | |||||
| 6 μm | ~1.68 μm | |||||
| 2008 [ | Glass | Water | Hydrophilic | -- | No-slip | WD/PD |
| PDMS | 105° | -- | 2 μm | |||
| PDMS (SP) | 136–145° | -- | 0.4–5.4 μm | |||
Symbols: --: unknown parameter; OTS: octadecyltrichlorosilane; CDOS: chlorodimethyloctylsilane; PDMS: polydimethylsiloxane; SP: surface patterned; ASC: aerogel solution coating; CNT: carbon nanotubes; rms: root mean square; SRI: shear rate independence; RD: roughness dependence; WD: wettability dependence; PD: pattern dependence.
Summary of experimental measurements of the slip length using the FCC technique.
| 2003 [ | Mica | Water | -- | 15 nm (pp) | 0.5–0.86 μm | -- |
| Glass | Water | 5–10° | 0.6–1 μm | -- | ||
| NaCl solutions | 0.2–0.6 μm | -- |
Symbols: --: unknown parameter; pp: peak to peak.
Summary of MD simulation results on liquid boundary slip.
| Authors | Solid/Liquid | Flow | Wetta-bility | Roughness | Slip length | Parameter dependence |
|---|---|---|---|---|---|---|
| 1988 [ | RL/LJ | PF+CL | 0–79° | No | Slip near CL | -- |
| 1989 [ | RL/LJ | PF | Complete | No | −2σ–0 | -- |
| 1989 [ | RL/LJ | CF+CL | 0–90° | No | Slip near CL | -- |
| 1989 [ | RL/LJ | PF | 0–80° | No | 0–10 σ | -- |
| CF | ||||||
| 1990 [ | RL/LJ | CF | <90° | No | 0–2σ | WD |
| 1992 [ | RL/LJ | PF | -- | No | Slip for frozen walls | -- |
| 1997 [ | RL/LJ | CF | 0–140° | No | 0–60σ | SRD |
| 1999 [ | RL/LJ | PF+CL | 90–140° | No | 0–50σ | WD |
| CF+CL | ||||||
| 2000 [ | RL/hexadecane | CF | Complete | 0.4-0.8 (SIN) | nm 0–10 nm | RD |
| 2001 [ | RL/LJ | PF | -- | No | 0–15σ | WD |
| CF | ||||||
| 2001 [ | CS/LJ | PF | -- | No | 1.8–10.4 nm | |
| 2002 [ | RL/LJ | PF | Complete | No | 0–5σ | -- |
| 2002 [ | CNT/LJ | PF | -- | No | 0–5 nm | -- |
| 2003 [ | RL/LJ | CF | 110–137° | ~10σ (GR) | 2–57 nm | RD |
| 2004 [ | Platinum/LJ | PF | 0–180° | No | 0–100 nm | SRD/WD |
| 2004 [ | RL/LJ | CF | Complete | Atomic | −4–4σ | RD |
| 2004 [ | RL/LJ | CF | 110-137° | ~10σ (GR) | 0–150σ | RD |
| 2004 [ | RL/Polymer | CF | -- | No | 0–70σ | SRD/CLD |
| 2004 [ | CNT/Water | PF | ~86° | No | −0.11–88 nm | CP |
| 2004 [ | RL/LJ or WCA | RF | -- | No | 0–6σ | NLS |
| 2005 [ | TW/LJ | PF | 90-140° | 1.7-3.3σ (GR) | −3–8σ | RD |
| 2005 [ | RL/LJ | CF | -- | No | −3–3σ | TD |
| 2006 [ | Platinum/LJ | CF | 0-130° | No | −1–15σ | WD |
| 2006 [ | Platinum/LJ | PF | 30-175° | 0-2.0 nm | −5–25σ | RD/WD |
| 2006 [ | CS/LJ | CF | 25-147° | No | 0–3.5 μm | WD |
| 2006 [ | TW/Chains | PF | 0-130° | No | −4–12σ | PD |
| 2006 [ | RL/LJ | CF | -- | No | −2–8σ | WD |
| 2007 [ | TW/LJ | CF | -- | No | 0–2.5σ | VD |
| 2007 [ | TW/LJ | PF | -- | No | −5–30σ | LPD |
| CF | ||||||
| 2007 [ | RL/LJ | PF | -- | No | 2–18σ | CSD |
| CF | ||||||
| 2008 [ | TW/ | CF | -- | No | 0–25 nm | SRD |
| 2008 [ | Alkylsilane/Water | CF | 40-150° | No | 0–20 nm | WD |
| Diamon/Water | 40-150° | -- | ||||
| 2008 [ | RL/ | CF | -- | No | 0–2 nm | WSD |
| 2009 [ | Kr/Ar | PF | -- | Atomic | 0–0.8σ | RD |
| 2009 [ | RL/Polymer | CF | -- | No | −6–24σ | SRD |
Symbols: --: unknown parameters; RL: rigid lattices; TW: thermal wall; CS: carbon sheet; CNT: carbon nanotubes; LJ: Lennard-Jones fluids; WCA: Weeks-Chandler-Andersen potential; CF: Couette flow; PF: Poiseuille flow; RF: rotatiing flow; CL: contact lines; SIN: sinusoidal roughness; GR: grooves; WD: wettability dependence; RD: roughness dependence; SRD: shear rate dependence; CLD: chain length dependence; CP: configuration dependence; NLS: nonlinear slippage due to fluid rotation; TD: temperature dependence; VD: viscosity dependence; LPD: lattice plane dependence; CSD: channel size dependence; WSD: wall speed dependence (defect slip and global slip); HMDCS: Hybrid molecular dynamics-continuum simulation; No: means “no artificial roughness”.
Summary of experimental measurements of the slip length using the NFLV-FR technique.
| 1999 [ | Sapphire | Hexadecane | Complete | 0.4 nm (rms) | 175 nm | SRI |
| Sapphire + FDS | 65° | No-slip | -- | |||
| Sapphire + OTS | 40° | 400 nm | SRI | |||
| Sapphire + STA | 25° | 350 nm | SRI | |||
| 2005 [ | Sapphire + Al2O3 | Squalane | 0° | 0.4 nm (rms) | 30 nm | WD/MSD |
| Sapphire + SiH | 20° | 0.4 nm (rms) | -- | |||
| Sapphire + OTS | 40° | 0.3 nm (rms) | 110 nm | |||
| Sapphire + Al2O3 | Hexadecane | 0° | 0.4 nm (rms) | 120 nm | WD/MSD | |
| Sapphire + SiH | 20° | 0.4 nm (rms) | 240 nm | |||
| Sapphire + OTS | 40° | 0.3 nm (rms) | 350 nm | |||
Symbols: --: unknown parameter; FDS: perfluorodecanetrichlorosilane; OTS: octadecyltrichlorosilane; STA: stearic acid (octadecanoic acid); rms: root mean square; SRI: shear rate independence; WD: wettability dependence; MSD: molecular shape dependence.
| Kn < 0.001 | Continuum regime |
| 0.001< Kn < 0.1 | Slip regime |
| 0.1< Kn < 10 | Transition regime |
| Kn > 10 | Free molecular regime |
TMAC in microchannels.
| 1969 [ | N2 | brass | — | 0.007–0.237 | 0.9317 |
| 1998 [ | air | Si(1 nm) | — | — | 0.621–0.661 |
| Si(30 nm) | 0.749–0.803 | ||||
| 2001 [ | Ar | Si(0.8 nm) | 293 | 0.1–0.41 | 0.8 ± 0.1 |
| N2 | 0.1–0.34 | 0.83 ± 0.05 | |||
| CO2 | 0.1–0.44 | 0.88 ± 0.06 | |||
| 2001 [ | He, Ne, Ar, Kr | Ag | — | > 100 | 0.71–0.92 |
| Ti | 0.71–0.92 | ||||
| Ti with O2 adsorbed | 0.96–1.00 | ||||
| 2003 [ | He | glass, Si | 297-301 | 0.06–0.8 | 0.91 ± 0.03 |
| N2 | 0.002–0.59 | 0.87 ± 0.03 | |||
| 2003 [ | air | glass, Si(35 nm) | 298 | 0.00115(outlet) | 0.204 |
| 2004 [ | He, N2 | glass, Si | 294.2 | 0.029–0.22 | 0.93 |
| 0.002–0.008 | 1 | ||||
| 0.005–0.03 | 0.93 | ||||
| 0.027–0.09 | 0.93 | ||||
| 2004 [ | N2 | glass, Si(1.47 μm) | ≈300 | 0.001–0.024 (outlet) | 0.3–0.7 |
| 2004 [ | Ar | carbon nanotubes | — | — | 0.52±0.01 |
| N2 | |||||
| O2 | |||||
| 2006 [ | air | glass (2.0 nm) | 297 | 0.0017(outlet) | 0.85 |
| Si(6.43 nm) | |||||
| 2007 [ | He | Si(25.2 nm) | — | 0.009–0.309 | 0.914 ± 0.009 |
| Ar | 0.003–0.302 | 0.871 ± 0.017 | |||
| N2 | 0.003–0.291 | 0.908 ± 0.041 | |||
| 2007 [ | N2 | glass(2.0 nm) | 295.5 | 0.0137 (outlet) | 0.96 |
| SiO2(6.8 nm) | |||||
| 2007 [ | air | glass(0.07 μm) | — | 0.018 | 0.90 |
| 2007 [ | He, air | Disk(10 nm) | 301 | 0.0025–0.031 | 0.915, 0.885 |
| Disk(404 nm) | 0.357, 0.346 | ||||
| Disk(770 nm) | 0.253, 0.145 | ||||
| 2007 [ | He | Si(20 nm) | 293.45–297.46 | 0.03–0.7 | 0.910 ± 0.004 |
| 2008 [ | He | Si(20 nm) | — | 0.003–30 | 1.001 ± 0.019 |
| Ar | 0.947 ± 0.010 | ||||
| Xe | 0.947 ± 0.015 | ||||
| N2 | 0.954 ± 0.005 | ||||
Summary of experimental measurements of the slip length using the TIRV technique.
| 2006 [ | PDMS | DI-Water | Hydrophilic | 0.47 nm (rms) | 26–57 nm | SRD |
| PDMS + OTS | 120° | 0.35 nm (rms) | 37–96 nm | SRD | ||
| 2007 [ | PDMS + OTS | DI-Water | 120° | 0.35 nm (rms) | 50–110 nm | SRD |
| 0.1mM NaCl | 30–100 nm | SRD | ||||
| 1mM NaCl | 50–110 nm | SRD | ||||
| 2008 [ | PDMS | Water | <20° | 0.33 nm (rms) | −3–3 nm | -- |
| PDMS + OTS | 95° | 0.44 nm (rms) | 21–29 nm | -- | ||
| 2008 [ | Glass | Water | Hydrophilic | -- | No-slip | -- |
| Glass + OTS | 90° | -- | 45 nm | -- | ||
Symbols: --: unknown parameter; PDMS: polydimethylsiloxane; OTS: octadecyltrichlorosilane; DI: deionized; rms: root mean square; SRD: shear rate dependence.