Literature DB >> 19776492

Structure and haemocompatibility of ZnO films deposited by radio frequency sputtering.

Jia-Ying Ye1, Zhan-Yun Huang, Chen Min, Shi-Rong Pan, Di-Hu Chen.   

Abstract

ZnO films were first deposited on silicon and glass substrates using radio frequency sputtering and then annealed in air at different temperatures from 300 to 700 degrees C. The microstructures, surface energy and optical properties of ZnO films were examined by x-ray diffraction, Raman spectroscopy, contact angle test and UV-visible optical absorption spectroscopy, respectively. Results show that a perfectly oriented ZnO (0 0 2) thin film is obtained in all ZnO samples. Raman spectroscopy, in combination with those derived by UV-visible optical absorption spectroscopy, provides us with an accurate description of ZnO nature, revealing that, after annealing, ZnO films exhibit better crystallinity and narrower optical energy gap. The contact angle test denotes that the adhesive work and polar component of the surface energy of ZnO films increase steadily with the annealing temperature, which leads to more active interaction between annealed ZnO films and blood plasma. The platelet adhesion experiment shows that there are fewer platelets adhered to the surface of ZnO films compared to the polyurethane (PU) used in clinical application, suggesting ZnO's better compatibility with blood. As the annealing temperature increases, the number of platelets adhered to ZnO films increases correspondingly, which we believe is due to the narrower optical energy gap. Therefore, the appropriate surface properties and the wide optical energy gap of ZnO thin films are believed to be the main factors responsible for the excellent haemocompatibility.

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Year:  2009        PMID: 19776492     DOI: 10.1088/1748-6041/4/5/055004

Source DB:  PubMed          Journal:  Biomed Mater        ISSN: 1748-6041            Impact factor:   3.715


  1 in total

1.  Investigation of the Microstructure, Optical, Electrical and Nanomechanical Properties of ZnOx Thin Films Deposited by Magnetron Sputtering.

Authors:  Michał Mazur; Agata Obstarczyk; Witold Posadowski; Jarosław Domaradzki; Szymon Kiełczawa; Artur Wiatrowski; Damian Wojcieszak; Małgorzata Kalisz; Marcin Grobelny; Jan Szmidt
Journal:  Materials (Basel)       Date:  2022-09-21       Impact factor: 3.748

  1 in total

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