Literature DB >> 19582102

Adjusting resonant wavelengths and spectral shapes of ring resonators using a cladding SiN layer or KOH solution.

Sahnggi Park1, Kap-Joong Kim, Jong-Moo Lee, In-Gyoo Kim, Gyungock Kim.   

Abstract

It is shown that the resonant frequencies and the transmission spectra of ring resonators can be adjusted by depositing or etching the cladding nitride layer on the ring waveguide without introducing an extra loss or extra variations of channel spacing. The cladding nitride layer increases the minimum width of the gap in the coupling region to larger than 150nm which makes it possible to consider photolithography instead of E-beam lithography for the typical design rule of ring filters. KOH silicon etching can also adjust not only the resonance frequencies but also coupling coefficients with a small sacrifice of guiding loss.

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Year:  2009        PMID: 19582102     DOI: 10.1364/oe.17.011884

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  1 in total

1.  Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films.

Authors:  Mateusz Śmietana; Robert Mroczyński; Norbert Kwietniewski
Journal:  Materials (Basel)       Date:  2014-02-17       Impact factor: 3.623

  1 in total

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