Effects of chemical composition and the addition of H2 in a N2 atmospheric pressure dielectric barrier discharge on polymer surface functionalization.

We examined the effect of hydrogen content in various polymers in a N2/H2 discharge for surface amine functionalization. Three polymers (polyethylene (PE), polyvinylidene fluoride (PVDF), and poly(tetrafluoroethylene) (PTFE)) containing various amounts of hydrogen and fluorine were treated with an atmospheric pressure dielectric barrier discharge (DBD). While surface modification was observed on the PE and the PVDF in a pure N2 discharge, adding H2 in a N2 discharge was necessary to observe the fluorine etching on the surface of the PVDF and PTFE polymers. The presence of a slight amount of hydrogen in the gas mixture was also a prerequisite to the formation of amino groups on the surface of all three polymers (max NH2/C approximately 5%). Aging revealed that the modified polymer surfaces treated in a N2-H2 discharge were less prone to hydrophobic recovery than were surfaces treated in pure N2, due primarily to the presence of a higher density of polar groups on the surfaces. We demonstrated that H atoms in the discharge are necessary for the surface amine functionalization of polymers in a N2 atmospheric pressure DBD, regardless of polymer chemical composition. It is therefore possible to control the plasma functionalization process and to optimize the concentration and specificity of NH2 grafted onto polymer surfaces by varying the H2 concentration in a N2 atmospheric pressure DBD.