| Literature DB >> 19532847 |
F Y Gardes, K L Tsakmakidis, D Thomson, G T Reed, G Z Mashanovich, O Hess, D Avitabile.
Abstract
The trend in silicon photonics, in the last few years has been to reduce waveguide size to obtain maximum gain in the real estate of devices as well as to increase the performance of active devices. Using different methods for the modulation, optical modulators in silicon have seen their bandwidth increased to reach multi GHz frequencies. In order to simplify fabrication, one requirement for a waveguide, as well as for a modulator, is to retain polarisation independence in any state of operation and to be as small as possible. In this paper we provide a way to obtain polarization independence and improve the efficiency of an optical modulator using a V-shaped pn junction base on the natural etch angle of silicon, 54.7 deg. This modulator is compared to a flat junction depletion type modulator of the same size and doping concentration.Entities:
Year: 2007 PMID: 19532847 DOI: 10.1364/oe.15.005879
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894