| Literature DB >> 19498480 |
Shuang Zhang, Wenjun Fan, K J Malloy, S R Brueck, N C Panoiu, R M Osgood.
Abstract
We numerically demonstrate a metamaterial with both negative epsilon and negative mu over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques.Year: 2005 PMID: 19498480 DOI: 10.1364/opex.13.004922
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894