| Literature DB >> 19492376 |
Lianbing Zhang1, Avinash J Patil, Le Li, Angelika Schierhorn, Stephen Mann, Ulrich Gösele, Mato Knez.
Abstract
New uses for ALD: By applying standard metal oxide atomic layer deposition (ALD) to two types of porphyrins, site-specific chemical infiltration of substrate molecules is achieved: Diethylzinc can diffuse into the interior of porphyrin supramolecular structures and induce metalation of the porphyrin molecules from the vapor phase. A = Ph, p-HO(3)SC(6)H(4).Entities:
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Year: 2009 PMID： 19492376 DOI： 10.1002/anie.200900426
Source DB: PubMed Journal: Angew Chem Int Ed Engl ISSN： 1433-7851 Impact factor: 15.336