| Literature DB >> 19461790 |
Rod Taylor, C Hnatovsky, E Simova, D Rayner, M Mehandale, V Bhardwaj, P Corkum.
Abstract
The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.Entities:
Year: 2003 PMID： 19461790 DOI： 10.1364/oe.11.000775
Source DB: PubMed Journal: Opt Express ISSN： 1094-4087 Impact factor: 3.894