Literature DB >> 1944372

Strand-specific mutation spectra in repair-proficient and repair-deficient hamster cells.

P Menichini1, H Vrieling, A A van Zeeland.   

Abstract

The mutation spectrum induced by UV light has been determined at the hprt locus for both cultured normal (AA8) and UV-sensitive (UV-5) Chinese hamster ovary cells to investigate the effect of DNA repair on the nature of induced mutations. DNA base-pair changes of 23 hprt mutants of AA8 and of 28 hprt mutants of UV-5 were determined by sequence analysis of in vitro amplified hprt cDNA. Almost all mutants in AA8 carried single-base substitutions, transitions and transversions accounting for 38% and 62% of the base changes, respectively. In contrast, in repair-deficient cells (UV-5) tandem and nontandem double mutations represented a considerable portion of the mutations observed (30%), whereas the vast majority of base-pair substitutions were GC greater than AT transitions (87%). Moreover, 5 splice mutants and 2 frameshift mutations were found in the UV-5 collection. In almost all mutants analyzed base changes were located at dipyrimidine sites where UV photoproducts could have been formed. In AA8 the photolesions causing mutations were predominantly located in the nontranscribed strand whereas a strong bias for mutation induction towards photolesions in the transcribed strand was found in UV-5. We hypothesize that preferential removal of lesions from the transcribed strand of the hprt gene accounts for the observed DNA strand specificity of mutations in repair-proficient cells. Furthermore, differences in the degree of misincorporation opposite a lesion for lagging and leading strand DNA synthesis may dictate the pattern of UV-induced mutations in the absence of DNA repair.

Entities:  

Mesh:

Substances:

Year:  1991        PMID: 1944372     DOI: 10.1016/0027-5107(91)90224-c

Source DB:  PubMed          Journal:  Mutat Res        ISSN: 0027-5107            Impact factor:   2.433


  7 in total

1.  Increased UV resistance of a xeroderma pigmentosum revertant cell line is correlated with selective repair of the transcribed strand of an expressed gene.

Authors:  L Lommel; P C Hanawalt
Journal:  Mol Cell Biol       Date:  1993-02       Impact factor: 4.272

2.  Fidelity of replication of the leading and the lagging DNA strands opposite N-methyl-N-nitrosourea-induced DNA damage in human cells.

Authors:  T Basic-Zaninovic; F Palombo; M Bignami; E Dogliotti
Journal:  Nucleic Acids Res       Date:  1992-12-25       Impact factor: 16.971

3.  UVA-induced cyclobutane pyrimidine dimers form predominantly at thymine-thymine dipyrimidines and correlate with the mutation spectrum in rodent cells.

Authors:  Patrick J Rochette; Jean-Philippe Therrien; Régen Drouin; Daniel Perdiz; Nathalie Bastien; Elliot A Drobetsky; Evelyne Sage
Journal:  Nucleic Acids Res       Date:  2003-06-01       Impact factor: 16.971

4.  Strand specificity of mutagenic bypass replication of DNA containing psoralen monoadducts in a human cell extract.

Authors:  D C Thomas; D L Svoboda; J M Vos; T A Kunkel
Journal:  Mol Cell Biol       Date:  1996-05       Impact factor: 4.272

5.  Repair of UV-induced (6-4)photoproducts measured in individual genes in the Drosophila embryonic Kc cell line.

Authors:  J G de Cock; A van Hoffen; J Wijnands; G Molenaar; P H Lohman; J C Eeken
Journal:  Nucleic Acids Res       Date:  1992-09-25       Impact factor: 16.971

6.  Mutagenic specificity of solar UV light in nucleotide excision repair-deficient rodent cells.

Authors:  E Sage; B Lamolet; E Brulay; E Moustacchi; A Chteauneuf; E A Drobetsky
Journal:  Proc Natl Acad Sci U S A       Date:  1996-01-09       Impact factor: 11.205

7.  High frequency of genomic deletions induced by Me-lex, a sequence selective N3-adenine methylating agent, at the Hprt locus in Chinese hamster ovary cells.

Authors:  Debora Russo; Gilberto Fronza; Laura Ottaggio; Paola Monti; Alberto Inga; Prema Iyer; Barry Gold; Paola Menichini
Journal:  Mutat Res       Date:  2009-09-01       Impact factor: 2.433

  7 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.