| Literature DB >> 19392377 |
Anoop Singh Dhoot1, Casey Israel, Xavier Moya, Neil D Mathur, Richard Henry Friend.
Abstract
We have studied electrostatic field-induced doping in La0.8Ca0.2MnO3 transistors using electrolyte as a gate dielectric. For positive gate bias, electron doping drives a transition from a ferromagnetic metal to an insulating ground state. The thickness of the electrostatically doped layer depends on bias voltage but can extend to 5 nm requiring a field doping of 2x10;{15} charges per cm;{2} equivalent to 2.5 electrons per unit cell area. In contrast, negative gate voltages enhance the metallic conductivity by 30%.Entities:
Year: 2009 PMID: 19392377 DOI: 10.1103/PhysRevLett.102.136402
Source DB: PubMed Journal: Phys Rev Lett ISSN: 0031-9007 Impact factor: 9.161