Literature DB >> 19206570

Highly conducting patterned Pd nanowires by direct-write electron beam lithography.

T Bhuvana1, G U Kulkarni.   

Abstract

Palladium hexadecylthiolate is shown to serve as a negative-tone direct-write electron resist to produce nanopatterns down to 30 nm. The written patterns do not deviate much from the precursor in composition, while a post-treatment at 230 degrees C in air produced metallic Pd nanowires with residual carbon less than 10% and resistivity close to the bulk value, a desirable property of interconnects in nanocircuitry. The as-written patterns contain small nanocrystals (<5 nm) in a hydrocarbon matrix, which upon annealing aggregate to form well-connected networks of larger nanocrystals (5-15 nm), thus giving rise to metallic conductivity.

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Year:  2008        PMID: 19206570     DOI: 10.1021/nn700372h

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  7 in total

1.  Writing on Nanocrystals: Patterning Colloidal Inorganic Nanocrystal Films through Irradiation-Induced Chemical Transformations of Surface Ligands.

Authors:  Francisco Palazon; Mirko Prato; Liberato Manna
Journal:  J Am Chem Soc       Date:  2017-08-22       Impact factor: 15.419

2.  High-Throughput Direct Writing of Metallic Micro- and Nano-Structures by Focused Ga+ Beam Irradiation of Palladium Acetate Films.

Authors:  Alba Salvador-Porroche; Lucía Herrer; Soraya Sangiao; Patrick Philipp; Pilar Cea; José María De Teresa
Journal:  ACS Appl Mater Interfaces       Date:  2022-06-07       Impact factor: 10.383

3.  In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum.

Authors:  Jakub Jurczyk; Lex Pillatsch; Luisa Berger; Agnieszka Priebe; Katarzyna Madajska; Czesław Kapusta; Iwona B Szymańska; Johann Michler; Ivo Utke
Journal:  Nanomaterials (Basel)       Date:  2022-08-06       Impact factor: 5.719

4.  Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate.

Authors:  Luisa Berger; Jakub Jurczyk; Katarzyna Madajska; Iwona B Szymańska; Patrik Hoffmann; Ivo Utke
Journal:  Micromachines (Basel)       Date:  2021-05-20       Impact factor: 2.891

5.  Metal hierarchical patterning by direct nanoimprint lithography.

Authors:  Boya Radha; Su Hui Lim; Mohammad S M Saifullah; Giridhar U Kulkarni
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

6.  Self-assembled nanostructured resistive switching memory devices fabricated by templated bottom-up growth.

Authors:  Ji-Min Song; Jang-Sik Lee
Journal:  Sci Rep       Date:  2016-01-07       Impact factor: 4.379

7.  Scalable lithography from Natural DNA Patterns via polyacrylamide gel.

Authors:  JieHao Qu; XianLiang Hou; WanChao Fan; GuangHui Xi; HongYan Diao; XiangDon Liu
Journal:  Sci Rep       Date:  2015-12-07       Impact factor: 4.379

  7 in total

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