| Literature DB >> 19203207 |
Fengnian Xia1, Thomas Mueller, Roksana Golizadeh-Mojarad, Marcus Freitag, Yu-ming Lin, James Tsang, Vasili Perebeinos, Phaedon Avouris.
Abstract
We measure the channel potential of a graphene transistor using a scanning photocurrent imaging technique. We show that at a certain gate bias, the impact of the metal on the channel potential profile extends into the channel for more than one-third of the total channel length from both source and drain sides; hence, most of the channel is affected by the metal. The potential barrier between the metal-controlled graphene and bulk graphene channel is also measured at various gate biases. As the gate bias exceeds the Dirac point voltage, VDirac, the original p-type graphene channel turns into a p-n-p channel. When light is focused on the p-n junctions, an impressive external responsivity of 0.001 A/W is achieved, given that only a single layer of atoms are involved in photon detection.Entities:
Year: 2009 PMID: 19203207 DOI: 10.1021/nl8033812
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189