| Literature DB >> 19140164 |
Rudy Ghisleni1, Karolina Rzepiejewska-Malyska, Laetitia Philippe, Patrick Schwaller, Johann Michler.
Abstract
The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from microN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices. (c) 2009 Wiley-Liss, Inc.Entities:
Mesh:
Year: 2009 PMID: 19140164 DOI: 10.1002/jemt.20677
Source DB: PubMed Journal: Microsc Res Tech ISSN: 1059-910X Impact factor: 2.769