| Literature DB >> 19044333 |
Hidekazu Mimura1, Shinya Morita, Takashi Kimura, Daisuke Yamakawa, Weimin Lin, Yoshihiro Uehara, Satoshi Matsuyama, Hirokatsu Yumoto, Haruhiko Ohashi, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Hitoshi Ohmori, Kazuto Yamauchi.
Abstract
We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.Year: 2008 PMID: 19044333 DOI: 10.1063/1.2964928
Source DB: PubMed Journal: Rev Sci Instrum ISSN: 0034-6748 Impact factor: 1.523