Improved focused ion beam fabrication of near-field apertures using a silicon nitride membrane.

We report an improved fabrication method for C-shaped near-field apertures resonant in the near-IR regime. The apertures are created in a metal layer on a silicon nitride membrane using a focused ion beam and a through membrane milling technique that avoids two problems with fabricating very small apertures: gallium contamination and edge rounding. Finite-difference time-domain simulations predict a 63x more intense near field with a 2.2x smaller spot versus conventionally milled apertures. We verify the position of the simulated resonance peaks with experimental far-field transmission measurements where we also find an increase of 8.8x in intensity. Our method has applications to many other plasmonic devices including bow-tie and fractal apertures, periodic arrays, and gratings.