| Literature DB >> 18720976 |
Yuan Wang1, Werayut Srituravanich, Cheng Sun, Xiang Zhang.
Abstract
Nearfield scanning optical microscopy (NSOM) offers a practical means of optical imaging, optical sensing, and nanolithography at a resolution below the diffraction limit of the light. However, its applications are limited due to the strong attenuation of the light transmitted through the subwavelength aperture. To solve this problem, we report the development of plasmonic nearfield scanning optical microscope with an efficient nearfield focusing. By exciting surface plasmons, plasmonic NSOM probes are capable of confining light into a 100 nm spot. We show by nearfield lithography experiments that the intensity at the near field is at least one order stronger than the intensity obtained from the conventional NSOM probes under the same illumination condition. Such a high efficiency can enable plasmonic NSOM as a practical tool for nearfield lithography, data storage, cellular visualization, and many other applications requiring efficient transmission with high resolution.Year: 2008 PMID: 18720976 DOI: 10.1021/nl8023824
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189