Literature DB >> 18686954

Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics.

Jin-Kyun Lee1, Margarita Chatzichristidi, Alexander A Zakhidov, Priscilla G Taylor, John A DeFranco, Ha Soo Hwang, Hon Hang Fong, Andrew B Holmes, George G Malliaras, Christopher K Ober.   

Abstract

An acid-sensitive semiperfluoroalkyl resorcinarene was synthesized, and its lithographic properties were evaluated. Its solubility in segregated hydrofluoroether solvents enables the patterning of delicate organic electronic materials.

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Year:  2008        PMID: 18686954     DOI: 10.1021/ja803493m

Source DB:  PubMed          Journal:  J Am Chem Soc        ISSN: 0002-7863            Impact factor:   15.419


  4 in total

1.  Orthogonal patterning of multiple biomolecules using an organic fluorinated resist and imprint lithography.

Authors:  Kari M Midthun; Priscilla G Taylor; Carol Newby; Margarita Chatzichristidi; Panagiota S Petrou; Jin-Kyun Lee; Sotiris E Kakabakos; Barbara A Baird; Christopher K Ober
Journal:  Biomacromolecules       Date:  2013-03-28       Impact factor: 6.988

2.  A Dual Functional Diketopyrrolopyrrole-Based Conjugated Polymer as Single Component Semiconducting Photoresist by Appending Azide Groups in the Side Chains.

Authors:  Chenying Gao; Dandan Shi; Cheng Li; Xiaobo Yu; Xisha Zhang; Zitong Liu; Guanxin Zhang; Deqing Zhang
Journal:  Adv Sci (Weinh)       Date:  2022-03-23       Impact factor: 17.521

3.  Dry lithography of large-area, thin-film organic semiconductors using frozen CO(2) resists.

Authors:  Matthias E Bahlke; Hiroshi A Mendoza; Daniel T Ashall; Allen S Yin; Marc A Baldo
Journal:  Adv Mater       Date:  2012-09-11       Impact factor: 30.849

4.  Synergistic electrodeposition of bilayer films and analysis by Raman spectroscopy.

Authors:  Saadeldin E T Elmasly; Luca Guerrini; Joseph Cameron; Alexander L Kanibolotsky; Neil J Findlay; Karen Faulds; Peter J Skabara
Journal:  Beilstein J Org Chem       Date:  2018-08-21       Impact factor: 2.883

  4 in total

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