| Literature DB >> 18489187 |
Edward Bormashenko1, Roman Pogreb, Gene Whyman, Yelena Bormashenko, Rachel Jager, Tamir Stein, Alex Schechter, Doron Aurbach.
Abstract
Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications.Entities:
Year: 2008 PMID: 18489187 DOI: 10.1021/la800527q
Source DB: PubMed Journal: Langmuir ISSN: 0743-7463 Impact factor: 3.882