| Literature DB >> 18376870 |
Armando Rastelli1, Mathieu Stoffel, Angelo Malachias, Tsvetelina Merdzhanova, Georgios Katsaros, Klaus Kern, Till H Metzger, Oliver G Schmidt.
Abstract
Scanning probe microscopy combined with selective wet chemical etching is employed to quantitatively determine the full three-dimensional (3D) composition profiles of single strained SiGe/Si(001) islands. The technique allows us to simultaneously obtain 3D profiles for both coherent and dislocated islands and to collect data with large statistics. Lateral and vertical composition gradients are observed, and their origin is discussed. X-ray scattering measurements performed on a large sample area are used to validate the results.Entities:
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Year: 2008 PMID: 18376870 DOI: 10.1021/nl080290y
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189