Literature DB >> 18345058

Correction masks for thickness uniformity in large-area thin films.

F Villa1, A Martínez, L E Regalado.   

Abstract

Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.

Year:  2000        PMID: 18345058     DOI: 10.1364/ao.39.001602

Source DB:  PubMed          Journal:  Appl Opt        ISSN: 1559-128X            Impact factor:   1.980


  1 in total

1.  Uniformity masks design method based on the shadow matrix for coating materials with different condensation characteristics.

Authors:  Lichao Zhang; Xikun Cai
Journal:  ScientificWorldJournal       Date:  2013-10-08
  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.