Literature DB >> 18237172

The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor.

Arunkumar Panneerselvam1, Mohammad A Malik, Mohammad Afzaal, Paul O'Brien, Madeleine Helliwell.   

Abstract

Entities:  

Year:  2008        PMID： 18237172     DOI： 10.1021/ja078202j

Source DB:  PubMed          Journal:  J Am Chem Soc        ISSN： 0002-7863            Impact factor:   15.419


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  1 in total

1.  Electrocatalytic Properties of Pulse-Reverse Electrodeposited Nickel Phosphide for Hydrogen Evolution Reaction.

Authors:  Woohyeon Jo; Dasol Jeong; Jaebum Jeong; Taegeon Kim; Seungyeon Han; Minkyu Son; Yangdo Kim; Yong Ho Park; Hyunsung Jung
Journal:  Front Chem       Date:  2021-12-13       Impact factor: 5.221
  1 in total

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