Literature DB >> 18232888

Formation mechanism of one-dimensional Si islands on a H/Si(001) surface.

Jun Nara1, Hiroshi Kajiyama, Tomihiro Hashizume, Yuji Suwa, Seiji Heike, Shinobu Matsuura, Taro Hitosugi, Takahisa Ohno.   

Abstract

The formation mechanism of one-dimensional Si islands on a H/Si(001)-(2x1) surface is studied using scanning tunneling microscopy/spectroscopy and first-principles calculations. We observed that one-dimensional islands that are made from dimer chains are formed at the initial growth stages similar to the bare Si(001) surface. It is found that the number of odd-numbered dimer chains is larger than that of even-numbered dimer chains. We propose the growth processes of the two types of growth edges to explain the observation.

Entities:  

Year:  2008        PMID: 18232888     DOI: 10.1103/PhysRevLett.100.026102

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN: 0031-9007            Impact factor:   9.161


  1 in total

1.  Silicon epitaxy on H-terminated Si (100) surfaces at 250 °C.

Authors:  Xiao Deng; Pradeep Namboodiri; Kai Li; Xiqiao Wang; Gheorghe Stan; Alline F Myers; Xinbin Cheng; Tongbao Li; Richard M Silver
Journal:  Appl Surf Sci       Date:  2016-03-31       Impact factor: 6.707

  1 in total

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