Warning: Undefined array key "mm" in /www/wwwroot/www.ai-bt.com/si.php on line 10 Deprecated: trim(): Passing null to parameter #1 ($string) of type string is deprecated in /www/wwwroot/www.ai-bt.com/si.php on line 10 High quality antireflection coatings on laser facets by sputtered silicon nitride.

Literature DB >> 18204533

High quality antireflection coatings on laser facets by sputtered silicon nitride.

G Eisenstein, L W Stulz.

Abstract

Entities: Chemical

Year: 1984 PMID： 18204533 DOI： 10.1364/ao.23.000161

Source DB: PubMed Journal: Appl Opt ISSN： 1559-128X Impact factor: 1.980

Keyword Cloud
Cited

× No keyword cloud information.

1 in total

1. Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiN_x for Low Temperature Thin Film Encapsulation.

Authors: Kunsik An; Ho-Nyun Lee; Kwan Hyun Cho; Seung-Woo Lee; David J Hwang; Kyung-Tae Kang
Journal: Micromachines (Basel) Date: 2020-01-13 Impact factor: 2.891

1 in total

High quality antireflection coatings on laser facets by sputtered silicon nitride.

1. Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation.

1. Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiN_x for Low Temperature Thin Film Encapsulation.