Literature DB >> 18188856

Electron-beam chemical lithography with aliphatic self-assembled monolayers.

Nirmalya Ballav1, Soeren Schilp, Michael Zharnikov.   

Abstract

Year:  2008        PMID： 18188856     DOI： 10.1002/anie.200704105

Source DB:  PubMed          Journal:  Angew Chem Int Ed Engl        ISSN： 1433-7851            Impact factor:   15.336


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  8 in total

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Authors:  Jem-Kun Chen; Chi-Jung Chang
Journal:  Materials (Basel)       Date:  2014-01-28       Impact factor: 3.623

3.  Amine Terminated SAMs: Investigating Why Oxygen is Present in these Films.

Authors:  J E Baio; T Weidner; J Brison; D J Graham; Lara J Gamble; David G Castner
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4.  Understanding Complex Electron Radiolysis in Saline Solution by Big Data Analysis.

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5.  The resistive switching memory of CoFe2O4 thin film using nanoporous alumina template.

Authors:  Changjun Jiang; Lei Wu; WenWen Wei; Chunhui Dong; Jinli Yao
Journal:  Nanoscale Res Lett       Date:  2014-10-21       Impact factor: 4.703

6.  Preparation of Homopolymer, Block Copolymer, and Patterned Brushes Bearing Thiophene and Acetylene Groups Using Microliter Volumes of Reaction Mixtures.

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Journal:  Polymers (Basel)       Date:  2021-12-19       Impact factor: 4.329

7.  Understanding Chemical versus Electrostatic Shifts in X-ray Photoelectron Spectra of Organic Self-Assembled Monolayers.

Authors:  Thomas C Taucher; Iris Hehn; Oliver T Hofmann; Michael Zharnikov; Egbert Zojer
Journal:  J Phys Chem C Nanomater Interfaces       Date:  2016-01-25       Impact factor: 4.126

8.  Self-assembled nanostructured resistive switching memory devices fabricated by templated bottom-up growth.

Authors:  Ji-Min Song; Jang-Sik Lee
Journal:  Sci Rep       Date:  2016-01-07       Impact factor: 4.379
  8 in total

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