Literature DB >> 18071557

Arresting ultraviolet-laser damage in fused silica.

F Dahmani, S J Burns, J C Lambropoulos, S Papernov, A W Schmid.   

Abstract

The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions.

Entities:  

Year:  1999        PMID: 18071557     DOI: 10.1364/ol.24.000516

Source DB:  PubMed          Journal:  Opt Lett        ISSN: 0146-9592            Impact factor:   3.776


  1 in total

1.  Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching.

Authors:  Laixi Sun; Ting Shao; Jianfeng Xu; Xiangdong Zhou; Xin Ye; Jin Huang; Jian Bai; Xiaodong Jiang; Wanguo Zheng; Liming Yang
Journal:  RSC Adv       Date:  2018-09-18       Impact factor: 3.361

  1 in total

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