Literature DB >> 17749880

Femtosecond Laser Annealing of Silicon: The thermal melting and recrystallization processes invoked at slower speeds fail for subpicosecond pulses, a new twist on an old controversy.

A L Robinson.   

Abstract

Entities:  

Year:  1984        PMID： 17749880     DOI： 10.1126/science.226.4672.329

Source DB:  PubMed          Journal:  Science        ISSN： 0036-8075            Impact factor:   47.728


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  1 in total

1.  Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon.

Authors:  Camilo Florian; Daniel Fischer; Katharina Freiberg; Matthias Duwe; Mario Sahre; Stefan Schneider; Andreas Hertwig; Jörg Krüger; Markus Rettenmayr; Uwe Beck; Andreas Undisz; Jörn Bonse
Journal:  Materials (Basel)       Date:  2021-03-27       Impact factor: 3.623
  1 in total

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