Tight focusing of spatially variant vector optical fields with elliptical symmetry of linear polarization.

We study the tight-focusing properties of spatially variant vector optical fields with elliptical symmetry of linear polarization. We found the eccentricity of the incident polarized light to be an important parameter providing an additional degree of freedom assisting in controlling the field properties at the focus and allowing matching of the field distribution at the focus to the specific application. Applications of these space-variant polarized beams vary from lithography and optical storage to particle beam trapping and material processing.