Literature DB >> 17375173

Smallest lithographic marks generated by optical focusing systems.

T Grosjean1, D Courjon, C Bainier.   

Abstract

We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.

Year:  2007        PMID: 17375173     DOI: 10.1364/ol.32.000976

Source DB:  PubMed          Journal:  Opt Lett        ISSN: 0146-9592            Impact factor:   3.776


  3 in total

1.  High-speed maskless nanolithography with visible light based on photothermal localization.

Authors:  Jingsong Wei; Kui Zhang; Tao Wei; Yang Wang; Yiqun Wu; Mufei Xiao
Journal:  Sci Rep       Date:  2017-03-02       Impact factor: 4.379

2.  Numerical Study on Enhanced Line Focusing via Buried Metallic Nanowire Assisted Binary Plate.

Authors:  Hyuntai Kim
Journal:  Nanomaterials (Basel)       Date:  2021-01-22       Impact factor: 5.076

3.  Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

Authors:  Daniel Fan; Li Wang; Yasin Ekinci
Journal:  Sci Rep       Date:  2016-08-09       Impact factor: 4.379

  3 in total

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