Literature DB >> 17212451

Ordered binary arrays of Au nanoparticles derived from colloidal lithography.

Gang Zhang1, Dayang Wang, Helmuth Möhwald.   

Abstract

By using angle-resolved colloidal lithography and O2-plasma etched bilayers of hexagonally packed spheres as templates, we succeeded in fabrication of highly ordered binary arrays of gold nanoparticles with varied shapes, for instance, with a shuttlecock-like shape composed of a small crescent-shaped nanoparticle and a big fan-shaped one. The size and shape of both small and big nanoparticles obtained were manipulated by the plasma etching period and the incidence angle of Au vapor flow. The subsequent thermal annealing led to binary arrays of round Au nanoparticles with a rather narrow distribution in terms of size and shape. Our approach should pave a simple and versatile colloidal way to form binary nanoparticle arrays, holding immense promise for technical applications such as nanoelectronics and nanophotonics.

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Year:  2007        PMID: 17212451     DOI: 10.1021/nl062284c

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  4 in total

1.  Colloidal lithography for fabricating patterned polymer-brush microstructures.

Authors:  Tao Chen; Debby P Chang; Rainer Jordan; Stefan Zauscher
Journal:  Beilstein J Nanotechnol       Date:  2012-05-15       Impact factor: 3.649

2.  Templated fabrication of hollow nanospheres with 'windows' of accurate size and tunable number.

Authors:  Duan Xie; Yidong Hou; Yarong Su; Fuhua Gao; Jinglei Du
Journal:  Nanoscale Res Lett       Date:  2015-03-27       Impact factor: 4.703

3.  Gold nanoparticle transfer through photothermal effects in a metamaterial absorber by nanosecond laser.

Authors:  Hanmo Gong; Yuanqing Yang; Xingxing Chen; Ding Zhao; Xi Chen; Yiting Chen; Min Yan; Qiang Li; Min Qiu
Journal:  Sci Rep       Date:  2014-08-26       Impact factor: 4.379

4.  Scalable Fabrication of Quasi-Three-Dimensional Chiral Plasmonic Oligomers Based on Stepwise Colloid Sphere Lithography Technology.

Authors:  Shiwei Xie; Jinzhe Yang; Xiao Xiao; Yidong Hou; Jinglei Du; Lin Pang; Xie Li; Fuhua Gao
Journal:  Nanoscale Res Lett       Date:  2015-10-18       Impact factor: 4.703

  4 in total

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