Literature DB >> 17193158

Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography.

Francis P Gibbons1, Alex P G Robinson, Richard E Palmer, Mayanditheuar Manickam, Jon A Preece.   

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Year:  2006        PMID： 17193158     DOI： 10.1002/smll.200500443

Source DB:  PubMed          Journal:  Small        ISSN： 1613-6810            Impact factor:   13.281


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  2 in total

1.  Thermal decomposition of fullerene nanowhiskers protected by amorphous carbon mask.

Authors:  Hongxuan Guo; Chengxiang Wang; Kun'ichi Miyazawa; Hongxin Wang; Hideki Masuda; Daisuke Fujita
Journal:  Sci Rep       Date:  2016-12-19       Impact factor: 4.379

Review 2.  Charged particle single nanometre manufacturing.

Authors:  Philip D Prewett; Cornelis W Hagen; Claudia Lenk; Steve Lenk; Marcus Kaestner; Tzvetan Ivanov; Ahmad Ahmad; Ivo W Rangelow; Xiaoqing Shi; Stuart A Boden; Alex P G Robinson; Dongxu Yang; Sangeetha Hari; Marijke Scotuzzi; Ejaz Huq
Journal:  Beilstein J Nanotechnol       Date:  2018-11-14       Impact factor: 3.649
  2 in total

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