| Literature DB >> 17177394 |
Jinhong Shin1, Abdul Waheed, Kyriacos Agapiou, Wyatt A Winkenwerder, Hyun-Wu Kim, Richard A Jones, Gyeong S Hwang, John G Ekerdt.
Abstract
Thin films ( approximately 30 nm) of amorphous RuP alloys (P approximately 15-20%) can be grown by CVD from the single source precursor cis-H2Ru(PMe3)4 at 250-300 degrees C and 200 mTorr pressure on native SiO2.Entities:
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Year: 2006 PMID： 17177394 DOI： 10.1021/ja0673938
Source DB: PubMed Journal: J Am Chem Soc ISSN： 0002-7863 Impact factor: 15.419