Dipolar control of monolayer morphology: spontaneous SAM patterning.

A strategy for controlling relative placements of molecules within multicomponent monolayers at the solution-HOPG interface is demonstrated. The monolayers assemble from complementary pairs of 1,5-bis-alkyldiether-anthracenes bearing self-repelling side chains. Each diether side chain suffers repulsive dipolar interactions if it adsorbs next to an identical side chain in the morphology normally assumed by 1,5-bis-substituted-anthracene monolayers. Complementary side-chain pairs experience attractive dipolar interactions when adsorbed as neighbors in the normal morphology monolayer. The repulsive and attractive forces spontaneously drive formation of a patterned monolayer at the solution-HOPG interface. Each molecule adsorbs in its own row, sandwiched between two rows of the complementary anthracene. These studies demonstrate the viability of using weak dipolar interactions to control molecular placement and monolayer morphology and to pattern multicomponent monolayers.