Literature DB >> 16851423

Tantalum(V) nitride inverse opals as photonic structures for visible wavelengths.

Alessandro Rugge1, Jin-Seong Park, Roy G Gordon, Sarah H Tolbert.   

Abstract

The development of materials with a complete photonic band gap at visible wavelengths is believed to have the potential to lead to new control over long-lived emissive excited states, single molecule lasers, and nearly lossless nanoscale waveguides. In this work we move toward that goal with the synthesis of an inverse opal thin film of Ta3N5 produced through atomic layer deposition. The highly regular architecture achievable by atomic layer deposition is combined with an unusually high refractive index and transparency in at least part of the visible spectrum. The result is a material that represents the closest example to date of a photonic crystal with a band gap at optical wavelengths.

Entities:  

Year:  2005        PMID: 16851423     DOI: 10.1021/jp047068b

Source DB:  PubMed          Journal:  J Phys Chem B        ISSN: 1520-5207            Impact factor:   2.991


  2 in total

1.  Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting.

Authors:  Hamed Hajibabaei; Omid Zandi; Thomas W Hamann
Journal:  Chem Sci       Date:  2016-07-05       Impact factor: 9.825

2.  Templated non-oxide sol-gel preparation of well-ordered macroporous (inverse opal) Ta3N5 films.

Authors:  Christopher F Mallinson; Benjamin M Gray; Andrew L Hector; Martyn A McLachlan; John R Owen
Journal:  Inorg Chem       Date:  2013-08-15       Impact factor: 5.165

  2 in total

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