Literature DB >> 16842650

The low energy X-ray spectrometry technique as applied to semiconductors.

Pierre-François Staub1.   

Abstract

We describe the recent introduction of low energy X-ray emission spectrometry as a metrology technique to control the fabrication process in the integrated circuit industry. The benefits of this particular analytical method and the wide field of potential applications are addressed.

Year:  2006        PMID: 16842650     DOI: 10.1017/S1431927606060442

Source DB:  PubMed          Journal:  Microsc Microanal        ISSN: 1431-9276            Impact factor:   4.127



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