| Literature DB >> 16842650 |
Abstract
We describe the recent introduction of low energy X-ray emission spectrometry as a metrology technique to control the fabrication process in the integrated circuit industry. The benefits of this particular analytical method and the wide field of potential applications are addressed.Year: 2006 PMID: 16842650 DOI: 10.1017/S1431927606060442
Source DB: PubMed Journal: Microsc Microanal ISSN: 1431-9276 Impact factor: 4.127