| Literature DB >> 16759722 |
Van N Truskett1, Michael P C Watts.
Abstract
Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'molding and embossing' or 'transfer printing', will be discussed in the context of microarrays for genomics, proteomics and tissue engineering. Specifically, fabrication by nanoimprint lithography (NIL), UV-NIL, step and flash imprint lithography (S-FIL), micromolding by elastomeric stamps and micro- and nano-contact printing will be reviewed.Mesh:
Year: 2006 PMID: 16759722 DOI: 10.1016/j.tibtech.2006.05.005
Source DB: PubMed Journal: Trends Biotechnol ISSN: 0167-7799 Impact factor: 19.536