| Literature DB >> 16660497 |
Abstract
When cuttings or seedlings of Phaseolus aureus were treated proximally with malformin for 2 days in continuous white light, resistance to subsequent leaf abscission in the dark resulted. The amount of resistance diminished as the concentration of malformin decreased from 10 to 0.1 micromolar. Resistance to dark abscission persisted for 7 days in continuous light. Little resistance was obtained when cuttings were taken from seedlings grown under low irradiance and short photoperiods, but resistance gradually increased as the photoperiod increased. Resistance to dark abscission induced by malformin in light differs from inhibition of abscission by indoleacetic acid because when malformin is applied in the dark it stimulates abscission after distal or proximal application. Malformin induces resistance only in conjunction with light treatment.Entities:
Year: 1978 PMID: 16660497 PMCID: PMC1092101 DOI: 10.1104/pp.62.2.264
Source DB: PubMed Journal: Plant Physiol ISSN: 0032-0889 Impact factor: 8.340