Literature DB >> 165401

Effects of DNA-polymerase-defective and recombination-deficient mutations on the ultraviolet sensitivity of Bacillus subtilis spores.

N Munakata, C S Rupert.   

Abstract

The DNA of UV-irradiated Bacillus subtilis spores, which contains 5-thyminyl-5,6-dihydrothymine (TDHT) as the major thymine photoproduct, is known to be repaired during germination by two complementary mechanisms: (I) the well-known excision repair, and (2) a special process, "spore repair", which destroys TDHT in situ without rendering it acid-soluble. In the absence of both mechanisms TDHT is not removed, and spores are highly UV-sensitive. When either of two mutations (pol-59 and pol-151) giving defective DNA polymerase, or one (rec-A1) giving a recombination deficiency are introduced into strains defective in one of these known TDHT removal processes, the chemically measured elimination of TDHT from spore DNA is unaltered, but spore UV-sensitivity is increased. The pol mutations produce their greatest sensitivity increase in spores of strains already deficient for the in situ destruction of TDHT, while the rec mutation gives its maximum sensitivity increase to spores of strains lacking excision. These facts argue that the pol mutations interfere mostly with excision repair (presumably its later resynthesis step), shile the rec mutation impairs "spore repair" in some step occurring subsequent to the TDHT destruction in situ. With either of these impairments of the later repair steps, DNA of UV-irradiated and germinated spores is considerably degraded, unless germination is carried out in the presence of chloramphenicol.

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Year:  1975        PMID: 165401     DOI: 10.1016/0027-5107(75)90075-5

Source DB:  PubMed          Journal:  Mutat Res        ISSN: 0027-5107            Impact factor:   2.433


  14 in total

1.  Role of DNA repair in Bacillus subtilis spore resistance.

Authors:  B Setlow; P Setlow
Journal:  J Bacteriol       Date:  1996-06       Impact factor: 3.490

2.  Mechanism of the Heat Sensitization of Bacillus subtilis Spores by Ethidium Bromide.

Authors:  J H Hanlin; R A Slepecky
Journal:  Appl Environ Microbiol       Date:  1985-06       Impact factor: 4.792

3.  Ultraviolet sensitivity ofBacillus subtilis citD mutants.

Authors:  W F Burke; M McCammon
Journal:  Curr Microbiol       Date:  1978       Impact factor: 2.188

4.  Artificial and solar UV radiation induces strand breaks and cyclobutane pyrimidine dimers in Bacillus subtilis spore DNA.

Authors:  T A Slieman; W L Nicholson
Journal:  Appl Environ Microbiol       Date:  2000-01       Impact factor: 4.792

5.  Decreased UV light resistance of spores of Bacillus subtilis strains deficient in pyrimidine dimer repair and small, acid-soluble spore proteins.

Authors:  B Setlow; P Setlow
Journal:  Appl Environ Microbiol       Date:  1988-05       Impact factor: 4.792

6.  Postincision steps of photoproduct removal in a mutant of Bacillus cereus 569 that produces UV-sensitive spores.

Authors:  S Weinberger; Z Evenchick; I Hertman
Journal:  J Bacteriol       Date:  1983-11       Impact factor: 3.490

7.  Host cell reactivation of Bacillus subtilis bacteriophages.

Authors:  E Ferrari; A G Siccardi; A Galizzi; U Canosi; G Mazza
Journal:  J Bacteriol       Date:  1977-08       Impact factor: 3.490

8.  Transitory germinative excision repair in Bacillus subtilis.

Authors:  T C Wang; C S Rupert
Journal:  J Bacteriol       Date:  1977-03       Impact factor: 3.490

9.  Role of the Nfo and ExoA apurinic/apyrimidinic endonucleases in repair of DNA damage during outgrowth of Bacillus subtilis spores.

Authors:  Juan R Ibarra; Alma D Orozco; Juan A Rojas; Karina López; Peter Setlow; Ronald E Yasbin; Mario Pedraza-Reyes
Journal:  J Bacteriol       Date:  2008-01-18       Impact factor: 3.490

10.  Isolation and characterization of a Bacillus subtilis mutant with a defective N-glycosidase activity for uracil-containing deoxyribonucleic acid.

Authors: 
Journal:  J Bacteriol       Date:  1977-08       Impact factor: 3.490

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