Literature DB >> 16499552

A new experimental procedure to quantify annular dark field images in scanning transmission electron microscopy.

T Walther1.   

Abstract

A new procedure to quantify the contrast in annular dark field images recorded without lattice resolution in a scanning transmission electron microscope is proposed. The method relies on the use of an in-column energy filter prior to the annular dark field detector and the acquisition of a series of energy-filtered images as a function of the inner detection angle. When the image contrast of an interface between two materials in such energy-filtered annular dark field images is plotted vs. camera length and extrapolated to zero (i.e. infinite scattering angle), the contrast is shown to behave exactly as predicted by Rutherford's scattering formula (i.e. intensity scales proportional, variantZ2). This can then be used to determine the local chemistry at and the effective chemical widths of interfaces or thin films without any additional spectroscopy method for calibration, provided the global chemical composition is known. As examples, the systems SiGe/Si and InGaAs/Ge are considered in detail.

Year:  2006        PMID: 16499552     DOI: 10.1111/j.1365-2818.2006.01551.x

Source DB:  PubMed          Journal:  J Microsc        ISSN: 0022-2720            Impact factor:   1.758


  4 in total

1.  Chemical characterization of extra layers at the interfaces in MOCVD InGaP/GaAs junctions by electron beam methods.

Authors:  Cesare Frigeri; Alexey Aleksandrovich Shakhmin; Dmitry Anatolievich Vinokurov; Maria Vladimirovna Zamoryanskaya
Journal:  Nanoscale Res Lett       Date:  2011-03-03       Impact factor: 4.703

2.  Materials characterisation by angle-resolved scanning transmission electron microscopy.

Authors:  Knut Müller-Caspary; Oliver Oppermann; Tim Grieb; Florian F Krause; Andreas Rosenauer; Marco Schowalter; Thorsten Mehrtens; Andreas Beyer; Kerstin Volz; Pavel Potapov
Journal:  Sci Rep       Date:  2016-11-16       Impact factor: 4.379

3.  Measurement of Diffusion and Segregation in Semiconductor Quantum Dots and Quantum Wells by Transmission Electron Microscopy: A Guide.

Authors:  Thomas Walther
Journal:  Nanomaterials (Basel)       Date:  2019-06-08       Impact factor: 5.076

4.  Quantification and optimization of ADF-STEM image contrast for beam-sensitive materials.

Authors:  Karthikeyan Gnanasekaran; Gijsbertus de With; Heiner Friedrich
Journal:  R Soc Open Sci       Date:  2018-05-02       Impact factor: 2.963

  4 in total

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