Reentrant ordering transition of asymmetric copolymer solution film confined between polymer-grafted surfaces.

We study the equilibrium morphology of an asymmetric A-B diblock copolymer solution film confined between homopolymer-grafted substrates by using self-consistent-field calculations. We find that on decreasing the copolymer concentration, a reentrant structural transformation between hexagonal --> lamellar --> hexagonal phases occurs as a result of the competition between the wetting effect of the brush surface and the bulk phase behavior of the asymmetric copolymer driven by the A-B interfacial tension.