| Literature DB >> 16252768 |
R A Negres1, P DeMange, S G Demos.
Abstract
Laser annealing via preexposure to laser pulses at sub-damage-threshold fluences is known to improve the resistance of KDP crystals to laser-induced damage. Using a specific damage-testing method, we investigate the laser annealing process as a function of fluence and number of preexposure pulses (at 355 nm, 2.5 ns). Our aim is to reveal the key laser parameters in order to devise a practical and efficient protocol for optimizing performance of the material for operation in laser systems in the near UV. Results suggest that a near twofold improvement to the laser-damage performance can be achieved with a limited number of preexposure pulses.Entities:
Year: 2005 PMID: 16252768 DOI: 10.1364/ol.30.002766
Source DB: PubMed Journal: Opt Lett ISSN: 0146-9592 Impact factor: 3.776