Literature DB >> 16218739

Metal-induced assembly of a semiconductor island lattice: Ge truncated pyramids on Au-patterned Si.

J T Robinson1, J A Liddle, A Minor, V Radmilovic, D O Yi, P Alex Greaney, K N Long, D C Chrzan, O D Dubon.   

Abstract

We report the two-dimensional alignment of semiconductor islands using rudimentary metal patterning to control nucleation and growth. In the Ge on Si system, a square array of submicron Au dots on the Si (001) surface induces the assembly of deposited Ge adatoms into an extensive island lattice. Remarkably, these highly ordered Ge islands form between the patterned Au dots and are characterized by a unique truncated pyramidal shape. A model based on patterned diffusion barriers explains the observed ordering and establishes general criteria for the broader applicability of such a directed assembly process to quantum dot ordering.

Entities:  

Year:  2005        PMID: 16218739     DOI: 10.1021/nl051719d

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  1 in total

1.  Growth of GeSi nanoislands on nanotip-patterned Si (100) substrates with a stress-induced self-limiting interdiffusion.

Authors:  Ruifan Tang; Kai Huang; Hongkai Lai; Cheng Li; Zhiming Wu; Junyong Kang
Journal:  Nanoscale Res Lett       Date:  2012-06-26       Impact factor: 4.703

  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.