Literature DB >> 16159205

Kondo effect in electromigrated gold break junctions.

A A Houck1, J Labaziewicz, E K Chan, J A Folk, I L Chuang.   

Abstract

We present gate-dependent transport measurements of Kondo impurities in bare gold break junctions, generated with high yield using an electromigration process that is actively controlled. Thirty percent of measured devices show zero-bias conductance peaks. Temperature dependence suggests Kondo temperatures approximately 7 K. The peak splitting in magnetic field is consistent with theoretical predictions for g = 2, though in many devices the splitting is offset from 2g mu(B)B by a fixed energy. The Kondo resonances observed here may be due to atomic-scale metallic grains formed during electromigration.

Year:  2005        PMID: 16159205     DOI: 10.1021/nl050799i

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  3 in total

1.  An investigation into the feasibility of myoglobin-based single-electron transistors.

Authors:  Debin Li; Peter M Gannett; David Lederman
Journal:  Nanotechnology       Date:  2012-09-12       Impact factor: 3.874

2.  Nanogap structures for molecular nanoelectronics.

Authors:  Paolo Motto; Alice Dimonte; Ismael Rattalino; Danilo Demarchi; Gianluca Piccinini; Pierluigi Civera
Journal:  Nanoscale Res Lett       Date:  2012-02-09       Impact factor: 4.703

3.  Single molecule electronics and devices.

Authors:  Makusu Tsutsui; Masateru Taniguchi
Journal:  Sensors (Basel)       Date:  2012-05-30       Impact factor: 3.576

  3 in total

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