| Literature DB >> 16021420 |
Matti Putkonen1, Timo Sajavaara, Lauri Niinistö, Juhani Keinonen.
Abstract
This review introduces the possibilities of ion-beam techniques for the analysis of thin films and thin-film structures processed by atomic layer deposition (ALD). The characteristic features of ALD are also presented. The analytical techniques discussed include RBS, NRA and ERDA with its variants, viz. the TOF-ERDA and HI-ERDA. The thin film examples are taken from flat-panel display technology (TFEL structures) and the semiconductor industry (high-k insulators).Entities:
Mesh：
Substances：
Year: 2005 PMID： 16021420 DOI： 10.1007/s00216-005-3365-3
Source DB: PubMed Journal: Anal Bioanal Chem ISSN： 1618-2642 Impact factor: 4.142