Literature DB >> 15943460

Nanometer patterning with ice.

Gavin M King1, Gregor Schürmann, Daniel Branton, Jene A Golovchenko.   

Abstract

Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.

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Year:  2005        PMID: 15943460      PMCID: PMC1432218          DOI: 10.1021/nl050405n

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  3 in total

Review 1.  Nanoelectromechanical systems.

Authors:  H G Craighead
Journal:  Science       Date:  2000-11-24       Impact factor: 47.728

2.  Pushing the limits of lithography

Authors: 
Journal:  Nature       Date:  2000-08-31       Impact factor: 49.962

3.  Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions.

Authors: 
Journal:  Phys Rev B Condens Matter       Date:  1993-10-01
  3 in total
  8 in total

1.  Ice lithography for nanodevices.

Authors:  Anpan Han; Dimitar Vlassarev; Jenny Wang; Jene A Golovchenko; Daniel Branton
Journal:  Nano Lett       Date:  2010-11-01       Impact factor: 11.189

2.  An ice lithography instrument.

Authors:  Anpan Han; John Chervinsky; Daniel Branton; J A Golovchenko
Journal:  Rev Sci Instrum       Date:  2011-06       Impact factor: 1.523

3.  Nanopatterning on nonplanar and fragile substrates with ice resists.

Authors:  Anpan Han; Aaron Kuan; Jene Golovchenko; Daniel Branton
Journal:  Nano Lett       Date:  2012-01-13       Impact factor: 11.189

4.  Ice-assisted electron beam lithography of graphene.

Authors:  Jules A Gardener; J A Golovchenko
Journal:  Nanotechnology       Date:  2012-04-13       Impact factor: 3.874

5.  Ice-assisted electron-beam lithography for MoS2 transistors with extremely low-energy electrons.

Authors:  Guangnan Yao; Ding Zhao; Yu Hong; Rui Zheng; Min Qiu
Journal:  Nanoscale Adv       Date:  2022-05-16

6.  Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate.

Authors:  Luisa Berger; Jakub Jurczyk; Katarzyna Madajska; Iwona B Szymańska; Patrik Hoffmann; Ivo Utke
Journal:  Micromachines (Basel)       Date:  2021-05-20       Impact factor: 2.891

7.  Dry lithography of large-area, thin-film organic semiconductors using frozen CO(2) resists.

Authors:  Matthias E Bahlke; Hiroshi A Mendoza; Daniel T Ashall; Allen S Yin; Marc A Baldo
Journal:  Adv Mater       Date:  2012-09-11       Impact factor: 30.849

8.  Electron beam lithography with feedback using in situ self-developed resist.

Authors:  Ripon Kumar Dey; Bo Cui
Journal:  Nanoscale Res Lett       Date:  2014-04-16       Impact factor: 4.703

  8 in total

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