Selective surface activation of a functional monolayer for the fabrication of nanometer scale thiol patterns and directed self-assembly of gold nanoparticles.

Application of a voltage bias between the tip of an atomic force microscope (AFM) and a silicon substrate causes the localized modification of a specially designed self-assembled monolayer (SAM), transforming a surface-bound thiocarbonate into a surface-bound thiol. The resulting surface-bound thiols are used to direct the patternwise self-assembly of gold nanoparticles (AuNPs). This methodology is applied to deposit individual AuNPs onto a surface with nanometer precision and to produce 10 nm lines of closely spaced AuNPs that are a single nanoparticle in width.