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Literature DB >> 15835648

Lithography with a focused soft X-ray beam and a monomolecular resist.

Abstract

Year: 2004 PMID： 15835648 DOI： 10.1021/la030398n

Source DB: PubMed Journal: Langmuir ISSN： 0743-7463 Impact factor: 3.882

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Authors: Zhe She; Andrea Difalco; Georg Hähner; Manfred Buck
Journal: Beilstein J Nanotechnol Date: 2012-02-06 Impact factor: 3.649

1 in total