Literature DB >> 14683325

Observation of non-Gaussian conductance fluctuations at low temperatures in Si:P(b) at the metal-insulator transition.

Swastik Kar1, A K Raychaudhuri, Arindam Ghosh, H V Löhneysen, G Weiss.   

Abstract

We report investigations of conductance fluctuations (with 1/f(alpha) power spectra) in doped silicon at low temperatures (T<20 K) as it is tuned through the metal-insulator transition (MIT) by changing the carrier concentration n. The scaled magnitude of noise, gamma(H), increases with decreasing T following an approximate power law gamma(H) approximately T-beta. At low T, gamma(H) diverges as n decreases through the critical concentration n(c), accompanied by a growth of low-frequency spectral weight. The second spectrum and probability density of the fluctuations show strong non-Gaussian behavior below 20 K as n/n(c) decreases through 1. This is interpreted as the onset of a glassy freezing of the electronic system across the MIT.

Entities:  

Year:  2003        PMID: 14683325     DOI: 10.1103/PhysRevLett.91.216603

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN: 0031-9007            Impact factor:   9.161


  1 in total

1.  Dephasing rates for weak localization and universal conductance fluctuations in two dimensional Si:P and Ge:P δ-layers.

Authors:  Saquib Shamim; S Mahapatra; G Scappucci; W M Klesse; M Y Simmons; Arindam Ghosh
Journal:  Sci Rep       Date:  2017-05-04       Impact factor: 4.379

  1 in total

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